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TEM/EDS

● TEM quality is competitive worldwide
● 5nm FinFET is available
● 2-3 working-day to provide TEM report (sample arrvied)

HOT! FEI Talos, OSIRIS/TEM + JOEL TEM

● FEI Talos

● FEI OSIRIS

● JEOL 2100F

TEM images of Samsung application processes

 

EDS mapping of intel CUPs


Microstructure analysis: lattice image, IC process monitor, crystal defect observation. Phase identification and composition analysis.

  • a TEM inspection of the multi-metal-layer process with Cu dual-damascene structure
  • b IC structure observation
  • c High resolution TEM with the atomic scale resolution
  • d Grain size distribution measurement
  • e TEM/EDS analysis for study of Sn whisker growth, the composition distribution of Sn whisker.
    TEM inspection of LED MQWs and dislocation distribution.

▍Eng. Contact Window

Mr. Yao ext. 6237
E-mail: jack_yao@msscorps.com