Precision cut for the defectives for different kinds of material.
Sample preparation for TEM, SEM, SSRM and special request.
Mirco-probing system for advantage application.
(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam) x 22
Low energy benefits: lithographic resist
● At 1 kV, immediate shrinking and distortion
● stable at 500V
● Better Material and grain orientation contrast(SEI)
● To peruse higher resolution in low KV MSS has best SEM resolution 0.8nm@2KV
Ms. Chen ext.6211