Dual Beam



Single Beam



Precision cut for the defectives for different kinds of material.
Sample preparation for TEM, SEM, SSRM and special request. 
Mirco-probing system for advantage application.


(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam)  x 22



FIB(Dual Beam) Capability

Low energy benefits: lithographic resist
 ● At 1 kV, immediate shrinking and distortion                                     



 ● stable at 500V


● Better Material and grain orientation contrast(SEI)


● To peruse  higher resolution in low KV MSS has best SEM resolution 0.8nm@2KV

Eng. Contact Window 
Ms. Chen ext.6211

E-mail: lynn_chen@msscorps.com