DB FIB/EDS

Dual Beam

 

 

Single Beam

 

 

Precision cut for the defectives for different kinds of material.
Sample preparation for TEM, SEM, SSRM and special request. 
Mirco-probing system for advantage application.

 

(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam)  x 22

 

 

FIB(Dual Beam) Capability

Low energy benefits: lithographic resist
 
 ● At 1 kV, immediate shrinking and distortion                                     

 

 

 ● stable at 500V

 

● Better Material and grain orientation contrast(SEI)

 

● To peruse  higher resolution in low KV MSS has best SEM resolution 0.8nm@2KV


Eng. Contact Window 
Ms. Chen ext.6211

E-mail: lynn_chen@msscorps.com