After years of efforts and R&D work, MSS is now the first brand for material analysis in Taiwanese analytic market. We cooperate closely with our customers to be their best R&D partner and we can always conquer challengs by delivering new analytic methods to meet customers’ expectations.
For the coming year of 2018, we are happy to announce seven new service items.
– XTEM, Si base, for EUV photoresist material
– XTEM, Si base, for super-thin lamella thickness, 10 nm
– XTEM, Si base, for super-thin lamella thickness, 5 nm
– DB-FIB cross-section observation for EUV photoresist material
– FE-SEM/EDS UHR for photoresist material
– Curtain Effect Free (CEF) CP
– SEM stain for junction/defect/organic enhancement